File:Нанотехнологии.jpg

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Русский: Я нахожусь в лаборатории университета Aix Marseille Université, позади меня аппарат помогающий лучше исследователь свойства полупроводников в микроэлектронике. На тонкий слой кремния,толщина порядка микрометров, наноситься методом бомбёжки оксид кремния или германия. Всё это под большим давлением и температурой. Потом полученный результат тщательно анализируется под мощным микроскопом и получаются снимки.
English: I'm in the University Aix Marseille Université, behind me helped the best researcher of the properties of semiconductors in microelectronics . In a thin layer of silicon , the thickness of the order of micrometers , applied by bombing oxide of silicon or germanium . Everything is under high pressure and temperature. Then the result is carefully analyzed under a powerful microscope and take photos .
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Author Andyreynard

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current01:38, 14 November 2015Thumbnail for version as of 01:38, 14 November 2015832 × 1,456 (239 KB)Andyreynard (talk | contribs)User created page with UploadWizard

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