File:Ibm-7nm-chip.jpg

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DescriptionIbm-7nm-chip.jpg	English: SUNY College of Nanoscale Science and Engineering's Michael Liehr, left, and IBM's Bala Haranand look at wafer comprised of 7nm chips on Thursday, July 2, 2015, in a NFX clean room Albany. Several 7nm chips at SUNY Poly CNSE on Thursday in Albany. (Darryl Bautista/Feature Photo Service for IBM) Credit: IBM. Press release: http://www-03.ibm.com/press/us/en/photo/47302.wss
Date	2 July 2015, 10:20:56
Source	IBM press release http://www-03.ibm.com/press/us/en/photo/47302.wss
Author	IBM

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	Date/Time	Thumbnail	Dimensions	User	Comment
current	10:39, 13 July 2015		3,000 × 2,026 (2.45 MB)	Wjfox2005 (talk \| contribs)	User created page with UploadWizard

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- العلم في 2015
- مستخدم:ASammour/العلم في 2015
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- 2015 in science

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Image title	SUNY College of Nanoscale Science and Engineering's Michael Liehr, left, and IBM's Bala Haranand look at wafer comprised of 7nm chips on Thursday, July 2, 2015, in a NFX clean room Albany. Several 7nm chips at SUNY Poly CNSE on Thursday in Albany. (Darryl Bautista/Feature Photo Service for IBM)
Camera manufacturer	NIKON CORPORATION
Camera model	NIKON D750
Author	Darryl Bautista/Feature Photo Service for IBM
Copyright holder	(c) 2015 Feature Photo Service
Exposure time	1/80 sec (0.0125)
F-number	f/5
ISO speed rating	500
Date and time of data generation	10:20, 2 July 2015
Lens focal length	24 mm
Credit/Provider	Darryl Bautista/Feature Photo Service for IBM
Source	Feature Photo Service
Headline	IBM, SUNY Polytechnic
Usage terms	PR, Editorial Use Only. No advertising or annual report
City shown	ALBANY
Width	6,016 px
Height	4,016 px
Bits per component	8 8 8
Pixel composition	RGB
Orientation	Normal
Number of components	3
Horizontal resolution	300 dpi
Vertical resolution	300 dpi
Software used	Adobe Photoshop Elements 8.0 Windows
File change date and time	14:02, 8 July 2015
Y and C positioning	Co-sited
Exposure Program	Manual
Exif version	2.3
Date and time of digitizing	10:20, 2 July 2015
Meaning of each component	Y Cb Cr does not exist
Image compression mode	2
APEX shutter speed	6.321928
APEX aperture	4.643856
APEX exposure bias	0
Maximum land aperture	3 APEX (f/2.83)
Metering mode	Center weighted average
Light source	Unknown
Flash	Flash did not fire, compulsory flash suppression
DateTime subseconds	96
DateTimeOriginal subseconds	96
DateTimeDigitized subseconds	96
Supported Flashpix version	1
Color space	sRGB
Sensing method	One-chip color area sensor
File source	Digital still camera
Scene type	A directly photographed image
Custom image processing	Normal process
Exposure mode	Manual exposure
White balance	Manual white balance
Digital zoom ratio	1
Focal length in 35 mm film	24 mm
Scene capture type	Standard
Scene control	Low gain up
Contrast	Normal
Saturation	Normal
Sharpness	Normal
Subject distance range	Unknown
GPS tag version	0.0.3.2
Lens used	24.0 mm f/2.8
Supported Flashpix version	1
Image width	3,000 px
Image height	2,026 px
Date metadata was last modified	10:02, 8 July 2015
Rating (out of 5)	0
Unique ID of original document	F79ABB4E9D09440FCD977A07BD4657E1
Keywords	IBM SUNY Polytechnic
Contact information	editor@featurephoto.com http://www.featurephoto.com 450 Fashion Ave., Suite 1700 New York, NY, USA 212.944.1060
Province or state shown	NY
Sublocation of city shown	SUNY Polytechnic College of Nanoscale Science and Engineering
IIM version	3

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