File:Contact hole optimum EUV illumination vs pitch.png
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Contact_hole_optimum_EUV_illumination_vs_pitch.png (481 × 290 pixels, file size: 9 KB, MIME type: image/png)
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English: The optimum EUV illumination (quasar inner and outer sigma) is plotted as a function of contact hole pitch, with the half-pitch (hp) in units of k1 (=hp*NA/wavelength). Both 0.25 NA (26 nm and 28 nm half-pitches) and 0.33 NA (22 nm half-pitch) included. For larger pitches, conventional or annular illumination would be used. Layouts incorporating a wide range of pitches would require different illuminations for different densities within the layout, entailing separate exposures. Refs.: M. D. Smith et al., Proc. SPIE 8682, 868203 (2013); Y-S. Yen et al., Proc. SPIE 4691, 1530 (2002); S-Y. Oh et al., Proc. SPIE 4691 (2002). |
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.svg){kind=small} This diagram was created with Microsoft Excel. |
| Author | Guiding light |
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Guiding light at English Wikipedia, the copyright holder of this work, hereby publishes it under the following licenses:
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Permission is granted to copy, distribute and/or modify this document under the terms of the GNU Free Documentation License, Version 1.2 or any later version published by the Free Software Foundation; with no Invariant Sections, no Front-Cover Texts, and no Back-Cover Texts. A copy of the license is included in the section entitled GNU Free Documentation License. |
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| Date/Time | Dimensions | User | Comment |
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| 2018-01-02 06:15:08 | 481 × 290 | Guiding light | Uploading a self-made file using [[Wikipedia:File_Upload_Wizard|File Upload Wizard]] |
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| Date/Time | Thumbnail | Dimensions | User | Comment | |
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| current | 16:29, 20 August 2019 | | 481 × 290 (9 KB) | Dave louis john (talk | contribs) | Transferred from en.wikipedia (MTC!) (1.1.0) |
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